Ion Beams: In Situ Mitigation of Subsurface and Peripheral Focused Ion Beam Damage via Simultaneous Pulsed Laser Heating (Small 13/2016)
Source abstract
Abstract
Focused ion beam (FIB) processing is an important direct-write nanoscale synthesis technique; however it generates subsurface defects that can preclude its use for many applications. On page 1779 P.D. Rack and co-workers demonstrate an in situ laser assisted focused ion beam synthesis approach, which photothermally mitigates the defects generated in silicon during focused He+ and Ne+ exposures. Finally, the group shows that laser assisted FIB reduces the damage generated in graphene nanochannels fabricated via the He+ FIB.
Source: openalex_inverted_index · Quality: baseline
Research context
OpenAlex topics: Ion-surface interactions and analysis · Laser-induced spectroscopy and plasma · Integrated Circuits and Semiconductor Failure Analysis
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Affiliations
Materials Science and Engineering Department University of Tennessee Knoxville TN 37996 USA
Nanofabrication Research Laboratory Center for Nanophase Materials Sciences Oak Ridge National Laboratory Oak Ridge TN 37381 USA
Intel Corporation Santa Clara, MS: SC9‐68, 2200 Mission College Blvd CA 95054 USA
References
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