Block Copolymers: Laterally Ordered Sub-10 nm Features Obtained From Directed Self-Assembly of Si-Containing Block Copolymer Thin Films (Small 48/2015)

On page 6377, K. Aissou, G. Hadziioannou, and co-workers report the directed self-assembly of Si-containing block copolymer thin films on laser-inscribed azobenene-containing layers. These are shown to be useful to produce laterally ordered sub-10 nm features. One potential application for this processing technology is towards next-generation lithography, for instance, highly ordered 2D arrays of out-of-plane cylinders with an areal density of 2.9 teradots inch−2 are demonstrated.