Lithography: “Multipoint Force Feedback” Leveling of Massively Parallel Tip Arrays in Scanning Probe Lithography (Small 35/2015)
Source abstract
Abstract
High-precision leveling for polymer pen lithography is demonstrated by N.-J. Cho, S.-J. Cho, and co-workers with a 0.001° slope of feature edge-length variation over 1 cm-wide tip arrays. This approach, described on page 4526, employs a multi-point force sensing structure in order to take into account the magnitude and direction of the total applied force of the tip array.
Source: openalex_inverted_index · Quality: baseline
Research context
OpenAlex topics: Nanofabrication and Lithography Techniques · Advanced Measurement and Metrology Techniques · Adhesion, Friction, and Surface Interactions
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References
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