Voltage‐ and Metal‐assisted Chemical Etching of Micro and Nano Structures in Silicon: A Comprehensive Review (Small 35/2024)
Source abstract
Abstract
Chemical Etching The controlled voltage-assisted chemical etching (ECE) and metal-assisted chemical etching (MaCE) of silicon at the micro and nano scales represent two sides of the same coin, as illustrated in the cover art. In article number 2400499, Salvatore Surdo and Giuseppe Barillaro provide a unique understanding of ECE and MaCE technologies, highlighting the most recent advancements and exploring future perspectives in silicon micro and nano machining.
Source: openalex_inverted_index · Quality: baseline
Research context
OpenAlex topics: Nanowire Synthesis and Applications · Advancements in Semiconductor Devices and Circuit Design · Semiconductor materials and devices
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
Dipartimento di Ingegneria dell'Informazione Università di Pisa via G. Caruso 16 Pisa 56122 Italy
References
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