Tip‐Induced 3D Printing on the Nanoscale with Field Emission Scanning Probes
Source abstract
Abstract
Abstract 3D printing down to the nanoscale remains a significant challenge. In this paper, the study explores the use of scanning probes that emit low‐energy electrons (<100 eV) coupled with the localized injection and electron‐induced decomposition of precursor molecules, for the precise localized deposition of 3D nanostructures. The experiments are performed inside the chamber of a scanning electron microscope (SEM), enabling the use of the in‐built gas injector system (GIS) with gaseous naphthalene precursor for carbon deposition, as well as immediate inspection of the deposits by SEM. Substrate materials are planar fused silica with thin conductive coatings and non‐planar copper wedges. After investigation of the deposition process parameters, various 2D and 3D carbon deposits are grown. Vertical nanowires several microns in length with a diameter <100 nm are achieved and 3D deposits with a high degree of nanoscale branching are also obtained, presumably due to a charging effect. High aspect ratio carbon nanostructures such as those demonstrated here can be employed as miniaturized electrodes or field emitters. The tip‐based approach presented thus paves the way toward 3D nanoscale printing of various materials and functional nanostructures.
Source: crossref · Quality: baseline
Research context
OpenAlex topics: Advanced Electron Microscopy Techniques and Applications · Force Microscopy Techniques and Applications · Electron and X-Ray Spectroscopy Techniques
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
Institute of Micro‐ and Nanotechnologies MacroNano Microsystems Technology Group Technische Universität Ilmenau Max‐Planck‐Ring 12 98693 Ilmenau Germany
Department of Materials Science and Engineering University of California Berkeley CA 94720 USA
National Center for Electron Microscopy Molecular Foundry Lawrence Berkeley National Laboratory Berkeley CA 94720 USA
Funding
Deutsche Forschungsgemeinschaft · Office of Science · U.S. Department of Energy · Vector Stiftung
References (43)
Show source-provided references
1. 10.1016/j.inoche.2023.11116310.1016/j.inoche.2023.111163 ↗
2. 10.1088/2631-7990/acfc0310.1088/2631-7990/acfc03 ↗
3. 10.3390/polym1318310110.3390/polym13183101 ↗
4. 10.1002/sus2.1110.1002/sus2.11 ↗
5. 10.3390/mi1104039710.3390/mi11040397 ↗
6. 10.1063/1.8915510.1063/1.89155 ↗
7. 10.1116/1.58393710.1116/1.583937 ↗
8. 10.1063/1.509237210.1063/1.5092372 ↗
9. 10.1116/1.295572810.1116/1.2955728 ↗
10. 10.1116/1.57641310.1116/1.576413 ↗
11. 10.1088/0508-3443/4/4/30210.1088/0508-3443/4/4/302 ↗
12. 10.1063/1.169786310.1063/1.1697863 ↗
13. A. E.Vladár K. P.Purushotham M. T.Postek Metrology Inspection and Process Control for Microlithography XXII SPIE Advanced Lithography (San Jose California USA Sunday 24 February 2008) (SPIE Proceedings) (Eds.J AAllgair C JRaymond) SPIE 2008 p.692217 (accssed: March 2008) https://doi.org/10.1117/12.774015.10.1117/12.774015 ↗
14. 10.1080/1040843060093043810.1080/10408430600930438 ↗
15. 10.1088/0957-4484/20/37/37200110.1088/0957-4484/20/37/372001 ↗
16. 10.1016/j.mne.2022.10014610.1016/j.mne.2022.100146 ↗
17. 10.1002/adma.20231088710.1002/adma.202310887 ↗
18. Utke I. · 2012
19. 10.1063/1.194013810.1063/1.1940138 ↗
20. 10.1063/1.10996510.1063/1.109965 ↗
21. 10.1116/1.58516710.1116/1.585167 ↗
22. 10.1038/s41928-019-0330-210.1038/s41928-019-0330-2 ↗
23. 10.1007/s12274-020-2695-y10.1007/s12274-020-2695-y ↗
24. 10.1088/0957-4484/25/32/32200110.1088/0957-4484/25/32/322001 ↗
25. 10.1039/C7NR02306E10.1039/C7NR02306E ↗
26. 10.1007/s00339-006-3806-710.1007/s00339-006-3806-7 ↗
27. Mulders J. J. L. · Proc. Beilstein Bozen Symp. Funct. Nanosci. · 2010 · 1 · 179
28. 10.1116/1.512328710.1116/1.5123287 ↗
29. 10.1063/1.337488510.1063/1.3374885 ↗
30. 10.1116/1.504835710.1116/1.5048357 ↗
31. 10.1088/0957-4484/22/5/05530210.1088/0957-4484/22/5/055302 ↗
32. 10.1088/2631-7990/aba2d810.1088/2631-7990/aba2d8 ↗
33. 10.1080/0950083940824243610.1080/09500839408242436 ↗
34. 10.3390/mi1203023210.3390/mi12030232 ↗
35. 10.1021/am500800310.1021/am5008003 ↗
36. 10.3762/bjnano.6.4710.3762/bjnano.6.47 ↗
37. 10.1116/1.504819310.1116/1.5048193 ↗
38. Hofmann M. · J. Vac. Sci. Technol., B: Nanotechnol. Microelectron.: Mater., Process., Meas., Phenom. · 2019 · 37
39. 10.1016/S0925-9635(00)00569-010.1016/S0925-9635(00)00569-0 ↗
40. 10.1063/1.503446910.1063/1.5034469 ↗
41. 10.1201/b1567310.1201/b15673 ↗
42. 10.51202/978318676105710.51202/9783186761057 ↗
43. 10.1021/am101017310.1021/am1010173 ↗