Maskless, High‐Precision, Persistent, and Extreme Wetting‐Contrast Patterning in an Environmental Scanning Electron Microscope

A maskless and programmable direct electron beam writing method is reported for making high-precision superhydrophilic–superhydrophobic wetting patterns with 152° contact angle contrast using an environmental scanning electron microscope (ESEM). The smallest linewidth achieved is below 1 μm. The reported effects of the electron beam induced local plasma may also influence a variety of microscopic wetting studies in ESEM. As a service to our authors and readers, this journal provides supporting information supplied by the authors. Such materials are peer reviewed and may be re-organized for online delivery, but are not copy-edited or typeset. Technical support issues arising from supporting information (other than missing files) should be addressed to the authors. Please note: The publisher is not responsible for the content or functionality of any supporting information supplied by the authors. Any queries (other than missing content) should be directed to the corresponding author for the article.