New Design Concepts for the Fabrication of Nanometric Gap Structures: Electrochemical Oxidation of OTS Mono‐ and Bilayer Structures
Source abstract
Abstract
A reliable nanofabrication concept to engineer metallic nanometric gap structures and to incorporate silver nanoparticles within the gaps utilizing a combination of self-assembly strategies and electrochemical oxidation lithography is developed. The approach uses the differences in oxidation kinetics of n-octadecyltrichlorosilane (OTS) monolayer and bilayer structures. The processes are investigated in detail and form the basis for a new nanofabrication process.
Source: openalex_inverted_index · Quality: baseline
Research context
OpenAlex topics: Nanofabrication and Lithography Techniques · Molecular Junctions and Nanostructures · Force Microscopy Techniques and Applications
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
References (26)
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