Easy Fabrication of Electrically Insulating Nanogaps by Transfer Printing

Abstract An easy and cost‐effective method to reproducibly fabricate nanogaps over a large area is introduced. Gold is evaporated on low‐aspect‐ratio polydimethylsiloxane (PDMS) stamps at an angle of 60°. Afterwards, the stamp is brought into contact with a silicon/silicon dioxide substrate and subsequently peeled at rates varying from 1 to 3 mm s⁻¹, resulting in the fabrication of nanogaps between two gold electrodes. The fabrication of insulating nanogaps with a width down to 50 nm is demonstrated.