Resizing Metal‐Coated Nanopores Using a Scanning Electron Microscope
Source abstract
Abstract
Abstract Electron beam‐induced shrinkage provides a convenient way of resizing solid‐state nanopores in Si3N4 membranes. Here, a scanning electron microscope (SEM) has been used to resize a range of different focussed ion beam‐milled nanopores in Al‐coated Si3N4 membranes. Energy‐dispersive X‐ray spectra and SEM images acquired during resizing highlight that a time‐variant carbon deposition process is the dominant mechanism of pore shrinkage, although granular structures on the membrane surface in the vicinity of the pores suggest that competing processes may occur. Shrinkage is observed on the Al side of the pore as well as on the Si3N4 side, while the shrinkage rate is observed to be dependent on a variety of factors.
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Research context
OpenAlex topics: Semiconductor materials and devices · Nanopore and Nanochannel Transport Studies · Ion-surface interactions and analysis
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