Integration of a Close‐Packed Quantum Dot Monolayer with a Photonic‐Crystal Cavity Via Interfacial Self‐Assembly and Transfer

Interfacial self-assembly and transfer of a freestanding PbS/polymer superlattice monolayer is a new technique to integrate colloidal quantum dots with photonic crystal microcavities, achieving a Q factor of 8060. This technique enables large area integration of self-assembled nanostructures with inherently large area lithographically patterned substrates. The freestanding, highly ordered nanoparticle/polymer monolayer superlattices are mechanically robust, enabling transfer to arbitrary substrates, even with complex surface features. As such this general approach may be useful in integrating the burgeoning field of ‘bottom-up’ nanoparticle self-assembly with ‘top down’ lithography.