Plasma‐Etched Nanopore Polymer Films and Their Use as Templates to Prepare “Nano Test Tubes”

Open ended…︁ A plasma-etch method, using a nanopore alumina film as the mask, was used to etch a replica of the alumina pore structure into the surface of a photoresist film; the thickness of the nanopore layer is controlled by the etch duration. The pores in such plasma-etched films were then used as templates to prepare silica nano test tubes (see image). The length of the test tubes (as small as 380 nm) is determined by the thickness of the porous part of the photoresist film.