journal article·2012-09-25

High Current Density and Nonlinearity Combination of Selection Device Based on TaOx/TiO2/TaOx Structure for One Selector–One Resistor Arrays

Wootae Lee, Jubong Park, Seonghyun Kim, Jiyong Woo, Jungho Shin, Godeuni Choi, Sangsu Park, Daeseok Lee, Euijun Cha, Byoung Hun Lee, Hyunsang Hwang

ACS Nano· Volume 6· Issue 9
Publisher page

Abstract

We demonstrate a high-performance selection device by utilizing the concept of crested oxide barrier to suppress the sneak current in bipolar resistive memory arrays. Using a TaO(x)/TiO(2)/TaO(x) structure, high current density over 10(7) A cm(-2) and excellent nonlinear characteristics up to 10(4) were successfully demonstrated. On the basis of the defect chemistry and SIMS depth profile result, we found that some Ta atoms gradually diffused into TiO(2) film, and consequently, the energy band of the TiO(2) film was symmetrically bent at the top and bottom TaO(x)/TiO(2) interfaces and modified as a crested oxide barrier. Furthermore, the one selector-one resistor device exhibited significant suppression of the leakage current, indicating excellent selector characteristics.
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Research context

OpenAlex topics: Advanced Memory and Neural Computing · Semiconductor materials and devices · Ferroelectric and Negative Capacitance Devices

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

School of Materials Science and Engineering, Gwangju Institute of Science and Technology, Oryong-dong, Buk-gu, Gwangju 500-712, Republic of Korea

Department of Material Science and Engineering, Pohang University of Science and Technology, 77 Cheongam-ro, Nam-gu, Pohang, Gyungbuk 790-784, Republic of Korea

Department of Nanobio Materials and Electronics, Gwangju Institute of Science and Technology, Oryong-dong, Buk-gu, Gwangju 500-712, Republic of Korea

References (31)

Show source-provided references
1. 2011
2. Waser R. · Nat. Mater. · 2007 · 6 · 83310.1038/nmat2023 ↗
3. Sawa A. · Mater. Today · 2008 · 11 · 2810.1016/S1369-7021(08)70119-6 ↗
4. Hasegawa Tsuyoshi · Adv. Mater. · 2012 · 24 · 25210.1002/adma.201102597 ↗
5. Lee M. · Nat. Mater. · 2011 · 10 · 62510.1038/nmat3070 ↗
6. Ahn S. · Adv. Mater. · 2008 · 20 · 92410.1002/adma.200702081 ↗
7. Yang J. J. · Appl. Phys. Lett. · 2010 · 97 · 23210210.1063/1.3524521 ↗
8. Tsubouchi K. · Adv. Mater. · 2007 · 19 · 171110.1002/adma.200601957 ↗
9. Cario L. · Adv. Mater. · 2010 · 22 · 519310.1002/adma.201002521 ↗
10. Cheng C. · Adv. Mater. · 2011 · 23 · 90210.1002/adma.201002946 ↗
11. Chen L. · IEEE Electron Device Lett. · 2010 · 31 · 1296
12. Miao F. · Adv. Mater. · 2011 · 23 · 563310.1002/adma.201103379 ↗
13. Kawai M. · Appl. Phys. Lett. · 2010 · 96 · 07210610.1063/1.3309709 ↗
14. Yan Z. B. · Appl. Phys. Lett. · 2010 · 96 · 01210310.1063/1.3280380 ↗
15. Wang Y. · Nanotechnology · 2010 · 21 · 04520210.1088/0957-4484/21/4/045202 ↗
16. Yan Z. · Adv. Mater. · 2011 · 23 · 135110.1002/adma.201004306 ↗
17. Lian W. · IEEE Electron Device Lett. · 2011 · 32 · 105210.1109/LED.2011.2157990 ↗
18. Linn E. · Nat. Mater. · 2010 · 9 · 40310.1038/nmat2748 ↗
19. Chang S. H. · Adv. Mater. · 2011 · 23 · 406310.1002/adma.201102395 ↗
20. Sheu S. · Symp. VLSI Circuits · 2009 · 82
21. Gopalakrishnana K. · Symp. VLSI Technol. · 2010 · 205
22. Kau D. · IEDM Tech. Dig. · 2009 · 617
23. Son M. · IEEE Electron Device Lett. · 2011 · 32 · 157910.1109/LED.2011.2163697 ↗
24. Huang J. · IEDM Tech. Dig. · 2011 · 733
25. Kim M. J. · IEDM Tech. Dig. · 2010 · 444
26. Likharev K. K. · Appl. Phys. Lett. · 1998 · 73 · 213710.1063/1.122402 ↗
27. Sasago Y. · Symp. VLSI Technol. · 2009 · 24
28. Furubayashi Y. · Appl. Phys. Lett. · 2005 · 86 · 25210110.1063/1.1949728 ↗
29. Navale S. C. · Ceram. Int. · 2007 · 33 · 30110.1016/j.ceramint.2005.07.026 ↗
30. Lee C. B. · IEEE Electron Device Lett. · 2011 · 32 · 39910.1109/LED.2010.2101044 ↗
31. Park J. · IEEE Electron Device Lett. · 2012 · 33 · 64610.1109/LED.2012.2188373 ↗