article·2016-01-07

Liquid-Phase Beam Pen Lithography

Shu He, Zhuang Xie, Daniel J. Park, Xing Liao, Keith A. Brown, Pengcheng Chen, Yu Zhou, George C. Schatz, Chad A. Mirkin

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Abstract

Beam pen lithography (BPL) in the liquid phase is evaluated. The effect of tip-substrate gap and aperture size on patterning performance is systematically investigated. As a proof-of-concept experiment, nanoarrays of nucleotides are synthesized using BPL in an organic medium, pointing toward the potential of using liquid phase BPL to perform localized photochemical reactions that require a liquid medium. As a service to our authors and readers, this journal provides supporting information supplied by the authors. Such materials are peer reviewed and may be re-organized for online delivery, but are not copy-edited or typeset. Technical support issues arising from supporting information (other than missing files) should be addressed to the authors. Please note: The publisher is not responsible for the content or functionality of any supporting information supplied by the authors. Any queries (other than missing content) should be directed to the corresponding author for the article.
Source: openalex_inverted_index · Quality: baseline

Research context

OpenAlex topics: Nanofabrication and Lithography Techniques · Advancements in Photolithography Techniques · Microfluidic and Capillary Electrophoresis Applications

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