Fabrication of a 3D Nanoscale Crossbar Circuit by Nanotransfer‐Printing Lithography

Abstract Nanotransfer‐printing lithography simplifies the fabrication of a 3D nanoscale crossbar circuit. Gold nanowires 100 nm in width and with 100 nm spacing are printed onto a polymer layer of electrically switchable, LiClO₄‐doped poly[2‐methoxy‐5‐(2′‐ethylhexyloxy)‐p‐phenylene vinylene] mixed with an epoxy. The transfer process can be repeated to obtain a multilayer nanoscale crossbar structure. This process paves the way toward fabricating 3D circuits with ultrahigh device density and neuromorphic architectures.