journal article·2009-02-20

AFM Tip Hammering Nanolithography

You Wang, Xiaodong Hong, Jun Zeng, Baoquan Liu, Bin Guo, Honghua Yan

Small· Volume 5· Issue 4
Publisher page

Abstract

Abstract Nanolithography at low cost and high speed is made possible by using a vibrating AFM tip in tapping‐mode as a nanohammer to forge polystyrene‐block‐poly(ethylene/butylenes)‐block‐polystyrene triblock copolymer monolayer thin films after annealing to transform their microstructures from as‐cast poorly ordered cylinders into well‐ordered hexagonal spheres. Annealing is accomplished in cyclohexane vapor, a selective solvent for the majority poly(ethylene/butylenes) block. Experimental results demonstrate that such structure‐tailored thin films enable macroscopic AFM tip writing to be performed in their surface; imprinted and embossed patterns can be generated with a sub‐20‐nm line‐width resolution. In addition, it is found that the lithographic patterns generated can be erased within 5 min by thermal annealing at 70 °C, and if necessary the erasion process can be expedited by increasing the annealing temperature.
Source: crossref · Quality: baseline

Research context

OpenAlex topics: Block Copolymer Self-Assembly · Nanofabrication and Lithography Techniques · Force Microscopy Techniques and Applications

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

References (48)

Show source-provided references
1. 10.1016/j.mser.2006.10.00110.1016/j.mser.2006.10.001 ↗
2. 10.1021/cr960069i10.1021/cr960069i ↗
3. 10.1021/cr020704m10.1021/cr020704m ↗
4. 10.1063/1.10781310.1063/1.107813 ↗
5. 10.1002/(SICI)1521-4095(199912)11:17<1473::AID-ADMA1473>3.0.CO;2-H10.1002/(SICI)1521-4095(199912)11:17<1473::AID-ADMA1473>3.0.CO;2-H ↗
6. 10.1063/1.132605310.1063/1.1326053 ↗
7. 10.1016/S0032-3861(02)00285-910.1016/S0032-3861(02)00285-9 ↗
8. 10.1016/S0039-6028(00)01113-410.1016/S0039-6028(00)01113-4 ↗
9. 10.1063/1.142163210.1063/1.1421632 ↗
10. 10.1002/pssa.20056615210.1002/pssa.200566152 ↗
11. 10.1038/nmat92610.1038/nmat926 ↗
12. 10.1063/1.162978710.1063/1.1629787 ↗
13. 10.1002/adma.20050020410.1002/adma.200500204 ↗
14. 10.1002/smll.20050037010.1002/smll.200500370 ↗
15. 10.1063/1.10846010.1063/1.108460 ↗
16. 10.1002/polb.2000210.1002/polb.20002 ↗
17. 10.1021/nl801203c10.1021/nl801203c ↗
18. 10.1021/nl070300f10.1021/nl070300f ↗
19. 10.1021/la034711x10.1021/la034711x ↗
20. 10.1021/ja017365j10.1021/ja017365j ↗
21. 10.1002/anie.20035230910.1002/anie.200352309 ↗
22. 10.1021/nl035054w10.1021/nl035054w ↗
23. 10.1002/1521-4095(20021016)14:20<1474::AID-ADMA1474>3.0.CO;2-210.1002/1521-4095(20021016)14:20<1474::AID-ADMA1474>3.0.CO;2-2 ↗
24. 10.1021/ja012502y10.1021/ja012502y ↗
25. 10.1021/ja017365j10.1021/ja017365j ↗
26. 10.1063/1.11731710.1063/1.117317 ↗
27. Boschung E. · Appl. Phys. Lett. · 1994 · 61 · 1003
28. 10.1002/smll.20060067910.1002/smll.200600679 ↗
29. 10.1021/ma800753a10.1021/ma800753a ↗
30. 10.1002/1521-3773(20020617)41:12<2034::AID-ANIE2034>3.0.CO;2-M10.1002/1521-3773(20020617)41:12<2034::AID-ANIE2034>3.0.CO;2-M ↗
31. 10.1002/app.2023510.1002/app.20235 ↗
32. 10.1021/ma00152a04110.1021/ma00152a041 ↗
33. 10.1021/ma00044a03510.1021/ma00044a035 ↗
34. 10.1002/app.1977.07021091110.1002/app.1977.070210911 ↗
35. 10.5254/1.353508310.5254/1.3535083 ↗
36. 10.1002/pen.76022110310.1002/pen.760221103 ↗
37. 10.1021/ba-1979-0176.ch01410.1021/ba-1979-0176.ch014 ↗
38. 10.1016/j.polymer.2006.05.07610.1016/j.polymer.2006.05.076 ↗
39. 10.1017/CBO978051180128010.1017/CBO9780511801280 ↗
40. 10.1021/ma60067a01110.1021/ma60067a011 ↗
41. 10.1016/S0039-6028(03)00388-110.1016/S0039-6028(03)00388-1 ↗
42. 10.1016/S0032-3861(96)00725-210.1016/S0032-3861(96)00725-2 ↗
43. 10.1016/S0039-6028(97)00412-310.1016/S0039-6028(97)00412-3 ↗
44. 10.1021/ma001311x10.1021/ma001311x ↗
45. 10.1038/334598a010.1038/334598a0 ↗
46. 10.1021/ma00080a02410.1021/ma00080a024 ↗
47. 10.1109/TASE.2006.87553510.1109/TASE.2006.875535 ↗
48. 10.1016/S0039-6028(00)00574-410.1016/S0039-6028(00)00574-4 ↗