Hybrid Top‐Down and Bottom‐Up Fabrication Approach for Wafer‐Scale Plasmonic Nanoplatforms

A generalized hybrid nanofabrication approach is reported that combines top-down (deep-UV lithography) and bottom-up (controlled lateral epitaxial growth) fabrication techniques for developing nanostructured platforms. This technology allows the development of reproducible substrates with controlled sub-10-nm gaps between plasmonic nanostructures over an entire 6 inch wafer. The plasmonic nanoplatforms are used for surface-enhanced Raman scattering-based detection of chemical and biological molecules. Detailed facts of importance to specialist readers are published as ”Supporting Information”. Such documents are peer-reviewed, but not copy-edited or typeset. They are made available as submitted by the authors. Please note: The publisher is not responsible for the content or functionality of any supporting information supplied by the authors. Any queries (other than missing content) should be directed to the corresponding author for the article.