Optical Lithography with Printed Metal Mask and a Simple Superhydrophobic Surface
Source abstract
Abstract
A nanolithographic optical patterning technique is presented. A metal pattern on a mold is transferred onto a photoresist on a substrate, then the resist with the printed metal mask is flood illuminated. The light passes through only the resist lenses that are formed in the transfer process. Focusing by these lenses results in a significant reduction in the feature size.
Source: openalex_inverted_index · Quality: baseline
Research context
OpenAlex topics: Surface Modification and Superhydrophobicity · Nanofabrication and Lithography Techniques · Optical Coatings and Gratings
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
References (17)
Show source-provided references
1. 10.1063/1.149322610.1063/1.1493226 ↗
2. 10.1021/nl034400710.1021/nl0344007 ↗
3. 10.1002/adma.20030618110.1002/adma.200306181 ↗
4. 10.1021/nl048835l10.1021/nl048835l ↗
5. 10.1002/smll.20050052810.1002/smll.200500528 ↗
6. 10.1126/science.113239410.1126/science.1132394 ↗
7. 10.1063/1.152587810.1063/1.1525878 ↗
8. 10.1002/adma.20040201010.1002/adma.200402010 ↗
9. 10.1063/1.12262110.1063/1.122621 ↗
10. 10.1063/1.11898810.1063/1.118988 ↗
11. 10.1021/nl060788510.1021/nl0607885 ↗
12. 10.1021/ja048972k10.1021/ja048972k ↗
13. We use EM‐Explorer software noncommercially and educationally only. The program can be found at http://www.emexplorer.net/.
14. Radius of curvature (r) is calculated by${r = {{h^2 + ({W \mathord{\left/ {\vphantom {W {2)^2 }}} \right. \kern-\nulldelimiterspace} {2)^2 }}} \over {2h}}}$ whereWis pattern width andhis height of patterns.
15. 10.1103/PhysRevLett.96.06600110.1103/PhysRevLett.96.066001 ↗
16. 10.1021/la020427e10.1021/la020427e ↗
17. 10.1002/adma.20050196110.1002/adma.200501961 ↗