Overcoming Challenges in Colloidal and Chemical Stability of Graphene Oxide with Exploration of Dispersing Solvent
Source abstract
Abstract
Abstract Graphene oxide (GO) offers immense potential across various applications, but its chemical and dispersion instabilities remain critical challenges. In this study, the role of solvent selection is investigated in enhancing the dispersion and chemical stability of GO after ripening. Through comprehensive characterization techniques, including rheology, SAXS, DLS, and SEM, it is demonstrated that solvents such as N‐Methyl‐2‐Pyrrolidinone (NMP), dimethylformamide (DMF), and dimethyl sulfoxide (DMSO) effectively maintain the colloidal stability of GO by mitigating gelation and flocculation, attributed to their favorable interactions with the graphitic domains. Notably, ethylene glycol (EG) exhibited superior chemical stability by inhibiting the diffusion of functional groups and preventing reduction even at elevated temperatures (up to 145 °C). The findings emphasize the influence of solvent selection on GO's microstructure, rheological properties, and thermal stability during ripening, thereby contributing to enhancing the longevity of GO‐based materials.
Source: crossref · Quality: baseline
Research context
OpenAlex topics: Graphene and Nanomaterials Applications · Graphene research and applications · Carbon and Quantum Dots Applications
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
Department of Chemical and Biological Engineering Institute of Chemical Processes Seoul National University Seoul 08826 Republic of Korea
Funding
National Research Foundation of Korea · Ministry of Science and ICT, South Korea
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