Scalable Fabrication of Multiplexed Plasmonic Nanoparticle Structures Based on AFM Lithography
Source abstract
Abstract
A controllable and scalable strategy is developed to fabricate multiplexed plasmonic nanoparticle structures by mechanical scratching with AFM lithography, which exhibit multiplex plasmonic properties and surface-enhanced Raman scattering responses. It offers an intuitive way to explore the plasmonic effects on the performance of an organic light-emitting diode device integrating with multiplexed plasmonic nanostructures. As a service to our authors and readers, this journal provides supporting information supplied by the authors. Such materials are peer reviewed and may be re-organized for online delivery, but are not copy-edited or typeset. Technical support issues arising from supporting information (other than missing files) should be addressed to the authors. Please note: The publisher is not responsible for the content or functionality of any supporting information supplied by the authors. Any queries (other than missing content) should be directed to the corresponding author for the article.
Source: openalex_inverted_index · Quality: baseline
Research context
OpenAlex topics: Plasmonic and Surface Plasmon Research · Gold and Silver Nanoparticles Synthesis and Applications
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
Institute of Functional Nano and Soft Materials (FUNSOM) Jiangsu Key Laboratory for Carbon‐Based Functional Materials and Devices Soochow University Suzhou Jiangsu 215123 China
College of Physics, Optoelectronics and Energy Institute of Chemical Power Sources Soochow University Suzhou 215006 China
Funding
Collaborative Innovation Center of Suzhou Nano Science & Technology · Priority Academic Program Development of Jiangsu Higher Education Institutions
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