Chemical Vapor Deposition Growth of Few-Layer MoTe2 in the 2H, 1T′, and 1T Phases: Tunable Properties of MoTe2 Films
Source abstract
Abstract
Chemical vapor deposition allows the preparation of few-layer films of MoTe 2 in three distinct structural phases depending on the growth quench temperature: 2H, 1T′, and 1T. We present experimental and computed Raman spectra for each of the phases and utilize transport measurements to explore the properties of the 1T MoTe 2 phase. Density functional theory modeling predicts a (semi-)metallic character. Our experimental 1T films affirm the former, show facile μA-scale source-drain currents, and increase in conductivity with temperature, different from the 1T′ phase. Variation of the growth method allows the formation of hybrid films of mixed phases that exhibit susceptibility to gating and significantly increased conductivity.
Source: openalex_inverted_index · Quality: baseline
Research context
OpenAlex topics: 2D Materials and Applications · MXene and MAX Phase Materials · Advanced Thermoelectric Materials and Devices
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
Department of Materials Science and Engineering, Stanford University, Stanford, California 94304, United States
Funding
Defense Advanced Research Projects Agency · Division of Graduate Education · Microelectronics Advanced Research Corporation · Division of Electrical, Communications and Cyber Systems · Division of Materials Research
References (39)
Show source-provided references
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