journal article·2010-10-26

The Influence of Strong Electron and Hole Doping on the Raman Intensity of Chemical Vapor-Deposition Graphene

Martin Kalbac, Alfonso Reina-Cecco, Hootan Farhat, Jing Kong, Ladislav Kavan, Mildred S. Dresselhaus

ACS Nano· Volume 4· Issue 10
Publisher page

Abstract

Electrochemical charging has been applied to study the influence of doping on the intensity of the various Raman features observed in chemical vapor-deposition-grown graphene. Three different laser excitation energies have been used to probe the influence of the excitation energy on the behavior of both the G and G' modes regarding their dependence on doping. The intensities of both the G and G' modes exhibit a significant but different dependence on doping. While the intensity of the G' band monotonically decreases with increasing magnitude of the electrode potential (positive or negative), for the G band a more complex behavior has been found. The striking feature is an increase of the Raman intensity of the G mode at a high value of the positive electrode potential. Furthermore, the observed increase of the Raman intensity of the G mode is found to be a function of laser excitation energy.
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Research context

OpenAlex topics: Graphene research and applications · Diamond and Carbon-based Materials Research · Nanowire Synthesis and Applications

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

J. Heyrovský Institute of Physical Chemistry, Academy of Sciences of the Czech Republic, v.v.i., Dolejškova 3, CZ-18223 Prague 8, Czech Republic

Department of Electrical Engineering and Computer Science, MIT, Cambridge, Massachusetts 02139, United States

Department of Materials Science and Engineering, MIT, Cambridge, Massachusetts 02139, United States

Department of Physics, MIT, Cambridge, Massachusetts 02139, United States

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