Atomic Resolution Imaging and Topography of Boron Nitride Sheets Produced by Chemical Exfoliation
Source abstract
Abstract
Here, we present a simple method for preparing thin few-layer sheets of hexagonal BN with micrometer-sized dimensions using chemical exfoliation in the solvent 1,2-dichloroethane. The atomic structure of both few-layer and monolayer BN sheets is directly imaged using aberration-corrected high-resolution transmission electron microscopy. Electron beam induced sputtering effects are examined in real time. The removal of layers of BN by electron beam irradiation leads to the exposure of a step edge between a monolayer and bilayer region. We use HRTEM imaging combined with image simulations to show that BN bilayers can have AB stacking and are not limited to just AA stacking.
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Research context
OpenAlex topics: Boron and Carbon Nanomaterials Research · Semiconductor materials and devices · Diamond and Carbon-based Materials Research
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
Department of Materials, University of Oxford, Parks Rd, Oxford OX1 3PH, United Kingdom
IFW Dresden, P.O. Box 270116, D-01171 Dresden, Germany
References (26)
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