The field emission properties of high aspect ratio diamond nanocone arrays fabricated by focused ion beam milling

High aspect ratio diamond nanocone arrays are formed on freestanding diamond film by means of focused ion beam (FIB) milling technology and hot-filament chemical vapor deposition (HFCVD) method. The structure and phase purity of an individual diamond nanocone are characterized by scanning electron microscopy (SEM) and micro-Raman spectroscopy. The result indicatesthat the diamond cones with high aspect ratio and small tip apex radius can be obtained by optimizing the parameters ofFIB milling and diamond growth. The diamond nanocone arrays were also used to study the electron field emission propertiesand electric field shielding effect, finding high emission current density, low threshold and weak shielding effect, all attributable to the high field enhancement factor and suitable cone density of the diamond nanocone emitter.