journal article·2016-01-01Open access

Removal of B from Si by Hf addition during Al–Si solvent refining process

Yun Lei, Wenhui Ma, Luen Sun, Jijun Wu, Yongnian Dai, Kazuki Morita

Abstract

A small amount of Hf was employed as a new additive to improve B removal in the electromagnetic solidification refinement of Si with an Al–Si melt, because Hf has a very strong affinity for B. The segregation ratio of Hf between the solid Si and Al–Si melt was estimated to range from 4.9 × 10−6 to 8.8 × 10−7 for Al concentrations of 0 to 64 at.%, respectively. The activity coefficient of Hf in solid Si at its infinite dilution was also estimated. A small addition of Hf (<1025 parts per million atoms, ppma) significantly improved the B removal. It was confirmed that the use of an increased Hf addition, slower cooling rate, and Al-rich Al–Si melt as the refining solvent removed B more efficiently. B in Si could be removed as much as 98.2% with 410 ppma Hf addition when the liquidus temperature of the Al–Si melt was 1173 K and the cooling rate was 4.5–7.6 K min–1. The B content in Si could be controlled from 153 ppma to 2.7 ppma, which meets the acceptable level for solar-grade Si.
Source: openalex_inverted_index · Quality: baseline

Research context

OpenAlex topics: Silicon and Solar Cell Technologies · Semiconductor materials and interfaces · Silicon Nanostructures and Photoluminescence

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

State Key Laboratory of Complex Nonferrous Metal Resources Clean Utilization, Kunming University of Science and Technology, Kunming 650093, PR China;

National Engineering Laboratory for Vacuum Metallurgy, Kunming University of Science and Technology, Kunming 650093, PR China;

Department of Materials Engineering, Graduate School of Engineering, The University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, 113-8656 Tokyo, Japan

Funding

National Natural Science Foundation of China

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