journal article·2008-01Open access

Present status and future prospects of spherical aberration corrected TEM/STEM for study of nanomaterials∗

Nobuo Tanaka

Abstract

The present status of Cs-corrected TEM/STEM is described from the viewpoint of the observation of nanomaterials. Characteristic features in TEM and STEM are explained using the experimental data obtained by our group and other research groups. Cs correction up to the 3rd-order aberration of an objective lens has already been established and research interest is focused on correcting the 5th-order spherical aberration and the chromatic aberration in combination with the development of a monochromator below an electron gun for smaller point-to-point resolution in optics. Another fundamental area of interest is the limitation of TEM and STEM resolution from the viewpoint of the scattering of electrons in crystals. The minimum size of the exit-wave function below samples undergoing TEM imaging is determined from the calculation of scattering around related atomic columns in the crystals. STEM does not have this limitation because the resolution is, in principle, determined by the probe size. One of the future prospects of Cs-corrected TEM/STEM is the possibility of extending the space around the sample holder by correcting the chromatic and spherical aberrations. This wider space will contribute to the ease of performing in situ experiments and various combinations of TEM and other analysis methods. High-resolution, in situ dynamic and 3D observations/analysis are the most important keywords in the next decade of high-resolution electron microscopy.
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Research context

OpenAlex topics: Advanced Electron Microscopy Techniques and Applications · Electron and X-Ray Spectroscopy Techniques · Integrated Circuits and Semiconductor Failure Analysis

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

EcoTopia Science Institute, Nagoya University, Chikusa-ku, Nagoya, 464-8603, Japan

References (23)

Show source-provided references
1. HillR J 1993 The Rietveld Method R AYoung Oxford Oxford University Press
2. SpenceJ C H 2003 High Resolution Electron Microscopy 3rd edn Oxford Oxford University Press
3. 10.1093/oxfordjournals.jmicro.a02361010.1093/oxfordjournals.jmicro.a023610 ↗
4. 10.1016/S0304-3991(99)00013-310.1016/S0304-3991(99)00013-3 ↗
5. 10.1063/1.169823310.1063/1.1698233 ↗
6. 10.1088/0370-1301/70/5/30510.1088/0370-1301/70/5/305 ↗
7. 10.1093/jmicro/52.1.6910.1093/jmicro/52.1.69 ↗
8. 10.1103/PhysRevB.73.01220510.1103/PhysRevB.73.012205 ↗
9. Taniguchi S · Philos. Mag. · 2008
10. Saitoh K · Proc. IMC · 2006 · 16 · p 1777
11. 10.1126/science.107912110.1126/science.1079121 ↗
12. 10.1093/jmicro/dfi02910.1093/jmicro/dfi029 ↗
13. 10.1093/jmicro/dfi07510.1093/jmicro/dfi075 ↗
14. 10.1088/0957-4484/15/12/01510.1088/0957-4484/15/12/015 ↗
15. 10.1021/nl060458k10.1021/nl060458k ↗
16. Tanaka N · Proc. IMC · 2006 · 16 · 598
17. BornMWolfE 1970 Principles of Optics 4th edn NewYork Pergamon section 8.8
18. 10.1093/jmicro/dfi02810.1093/jmicro/dfi028 ↗
19. Yamasaki J · Proc. IMC · 2006 · 16 · 1020
20. 10.1126/science.108388710.1126/science.1083887 ↗
21. 10.1063/1.272112010.1063/1.2721120 ↗
22. O'Keefe M A · Ultramicroscopy · 2007
23. Sawada H · Japan J. Appl. Phys. · 2007