journal article·2017-09

Analyzing flaws in electric components by scanning acoustic microscopy

R. B. Burov, A. A. Stoyanov, A. A. Vinokurov, V. V. Zenin

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Abstract

Flaws that occur due to the following processes involved in the production of electronic components have been examined: soldering of crystals to pack bases; assembly of flip-chips; and sealing of integrated circuits with a plastic. The analysis has been performed by scanning acoustic microscopy.
Source: openalex_inverted_index · Quality: baseline

Research context

OpenAlex topics: Integrated Circuits and Semiconductor Failure Analysis · Electronic Packaging and Soldering Technologies · Non-Destructive Testing Techniques

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

References (6)

Show source-provided references
1. Adams, T., Voids in electronic parts. Yield of ultrasound, Adv. Mater. Processes, 2013, vol. 171, no. 6, pp. 22–25.
2. Rinkevich, A.B., Korkh, Yu.V., and Smorodinskii, Ya.G., Prospects of the application of nondestructive testing to the diagnostics of nano- and microstructural materials, Russ. J. Nondestr. Test., 2010, vol. 46, no. 1, pp. 10–15.10.1134/S1061830910010031 ↗
3. Korkh, Yu.V., Burkhanov, A.M., and Rinkevich, A.B., Scanning acoustic microscope for visualization of microflaws in solids, Russ. J. Nondestr. Test., 2009, vol. 45, no. 10, pp. 16–26.10.1134/S1061830909100027 ↗
4. Korkh, Yu.V., Perov, D.V., and Rinkevich, A.B., Detection of subsurface microflaws using the high-frequency acoustic microscopy method, Russ. J. Nondestr. Test., 2015, vol. 51, no. 4, pp. 19–33.10.1134/S1061830915040051 ↗
5. Gotra, Z.Yu., Tekhnologiya mikroelektronnykh ustroistv. Spravochnik (Technology of Microelectronic Devices. A Handbook), Moscow: Radio i svyaz', 1991.
6. Zenin, V.V., Emel’yanov, V.A., and Lanin, V.L., Montazh kristallov i vnutrennikh vyvodov v proizvodstve poluprovodnikovykh izdelii (Assembly of Crystals and Internal Leads in Production of Semiconductor Articles), Minsk: Integralpoligraf, 2015.