Growth of tio(x) films magnetron sputtering by high power pulsed from a compound tio(1.8) target
Source abstract
Abstract
High power pulsed magnetron sputtering (HPPMS) has been employed for the growth of TiO(x) (x greater than 1.8) films from a ceramic TiO(1.8) target in an Ar-O(2) ambient. The film properties have b ...
Only a short abstract or summary was supplied by the source.
Source: openalex_inverted_index · Quality: short
Research context
OpenAlex topics: Metal and Thin Film Mechanics · Semiconductor materials and devices · ZnO doping and properties
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