Accelerated Photocuring of Acrylate Resins with WS2 Nanoparticles
Source abstract
Abstract
High Resolution Image Download MS PowerPoint Slide Radiation curing (photocuring) of thermosetting polymers, such as acrylate resins, is a common technology with diverse applications, such as in adhesives, coatings, advanced manufacturing, medical-related technologies, and more. Photocuring of acrylate thermosets is initiated via a radical-induced cleavage of a photocuring agent, like bis(2,4,6-trimethylbenzoyl)-phenylphosphineoxide (BAPO), which activates the vinyl C═C double bond of the acrylate moiety. Here, we show that addition of semiconducting WS 2 nanoparticles (NPs) accelerates the photocuring process. Using electron paramagnetic resonance (EPR) of ethanol–water solutions, the mechanism of the radical reactions of BAPO and WS 2 NPs is investigated. It is found that the two photocuring agents operate according to entirely different mechanisms, which has been discussed in great detail. In contrast to BAPO, which is photocleaved during the curing process, the WS 2 NPs remain unchanged, leading to major mechanical reinforcements of the cured acrylate film.
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Research context
OpenAlex topics: Advanced Photocatalysis Techniques · Photopolymerization techniques and applications · TiO2 Photocatalysis and Solar Cells
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
Department of Polymer Materials Engineering, Shenkar College, Ramat-Gan 5252626, Israel
Department of Chemical Research Support, Weizmann Institute, Rehovot 7610001, Israel
Department of Molecular Chemistry and Materials Science, Weizmann Institute, Rehovot 7610001, Israel
Funding
Innovation Authority of Israel
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