Low-Temperature Argon Plasma-Assisted Biofilm Colonization on Poly(l-Lactic Acid)/ Polyhydroxyalkanoate-Copolymer Cast Film for Enhanced Soil Biodegradation
Source abstract
Abstract
The surfaces of poly( l -lactic acid) (PLA), poly(3-hydroxybutyrate- co -3-hydroxyhexanoate) (PHBHHx), and their cast-film blends were activated using low-temperature argon plasma to confirm the possibility of improved microbial adhesion and biodegradation rate using soil microflora as a degrading medium. Radio frequency (RF) plasma systems selectively altered the surface characteristics of PLA/PHBHHx blend cast films without significantly affecting their bulk properties. Notably, Ar-etching (12 min, 50 W) promoted a strong hydrophilic behavior (up to 25 ± 2°), surface energy (up to 48 ± 5%), and surface roughness by ∼4-fold. The increased wettability on plasma-treated samples could be linked to the introduction of polar groups (C–O and O═C–O) and formation of distinct rough topographical structures, which provide a conducive microenvironment for the initial microbial attachment and subsequent biofilm formation. The enhanced wettability favors abiotic hydrolysis by promoting biofilm formation (30 ± 5%), which in turn stimulates the biodegradation rate by 1.1–1.5-fold. These findings indicate that surface activation by argon plasma is a sustainable and viable strategy to enhance cell-surface interactions and biodegradation of biopolymers.
Source: openalex_inverted_index · Quality: baseline
Research context
OpenAlex topics: biodegradable polymer synthesis and properties · Microplastics and Plastic Pollution · Graphene and Nanomaterials Applications
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
Centre for Sustainable Polymers
Indian Institute of Technology
Department of Electrical Engineering and Electronics, Kyoto Institute of Technology, Matsugasaki, Sakyo-ku, Kyoto 606-8585, Japan
Department of Biobased Materials Science
Kyoto Institute of Technology (KIT)
Faculty of Electrical Engineering and Electronics, Kyoto Institute of Technology, Matsugasaki, Sakyo-ku, Kyoto 606-8585, Japan
Department of Chemical engineering
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