Flexible and Speedy Preparation of Large-Scale Polystyrene Monolayer through Hemispherical-Depression-Assisted Self-Assembling and Vertical Lifting

Liquid interfacial self-assembled two-dimensional nanomonolayers are promising as colloidal crystal templates or lithographic masks for the mass production of periodic nanoarrays. However, the interfacial self-assembled monolayers usually suffer various defects such as grain boundaries, line defects, vacancy defects, and multilayers due to imperfect process technology. Here, we demonstrated a series of optimized strategies including the hemispherical-depression-assisted self-assembly, dot coating approach, and vertical lifting transfer protocol to eliminate surface defects especially multilayers jointly. After stabilizing the hemispherical depression height to 1.5 mm with a 40° tilted silicon slide, the self-assembly time was significantly shortened to 10 min for a 1 × 2 cm 2 area of PS monolayer. The series of strategies were successfully implemented not only on glass and silicon flat substrates but also on the side and end face of optical fiber, even on flexible substrates, while maintaining great morphologies. Besides, in association with nanospherical lens photolithography and nanosphere lithography technologies, various two-dimensional nanoarrays such as nanotriangles and nanoholes could be successfully obtained for subsequent optical properties research, which present broad application prospects in biochemical sensing, medicine, environmental protection, and other fields.