Chitosan as a Water-Developable 193 nm Photoresist for Green Photolithography
Source abstract
Abstract
International audience
Only a short abstract or summary was supplied by the source.
Source: openalex_inverted_index · Quality: short
Research context
OpenAlex topics: Conducting polymers and applications · Electrowetting and Microfluidic Technologies · Analytical Chemistry and Sensors
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
Affiliations
Université de Haute-Alsace, CNRS, IS2M UMR 7361, Mulhouse F-68100, France
Université de Strasbourg, Strasbourg Cedex F-67081, France
Univ Lyon, CNRS, INSA Lyon, Ecole Centrale de Lyon, Université Claude Bernard Lyon 1, CPE Lyon, INL, UMR5270, Ecully Cedex 69134, France
Univ Lyon, CNRS, Université Claude Bernard Lyon 1, Institut des Sciences Analytiques, UMR 5280, 5, rue de la Doua, Villeurbanne F-69100, France
Univ Lyon, CNRS, UMR 5223, Ingénierie des Matériaux Polymères, Université Claude Bernard Lyon 1, INSA Lyon, Université Jean Monnet, Villeurbanne Cédex F-69622, France
Univ. Grenoble Alpes, CEA, LETI, Grenoble F-38000, France
Funding
Agence Nationale de la Recherche
References (45)
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