journal article·2026-01-23

Nanometer-Thick Films of Ta-Doped Sb 2 Te 3 /TiTe 2 Superlattice-Like Nanostructures for Phase-Change Memory Data Storage

Hansang Sung, Jaemin Park, Siwoo Kim, Chanwoong Park, Jaein Park, Hangyu Lim, Seungyeon Lee, Seongwoo Park, Heon Lee

ACS Applied Nano Materials· Volume 9· Issue 3
Publisher page

Abstract

With growing demand for efficient data storage, phase-change memory (PCM) has emerged as a leading candidate for next-generation storage class memory (SCM) devices. In this study, we developed a high-performance PCM with a Ta-doped Sb 2 Te 3 (TST)/TiTe 2 (TT) superlattice-like (SLL) structure. Using an industry-friendly sputtering process, TST was combined with TT to create a thermal confinement effect that enhances low-power, high-speed performance. The optimized SLL structure shows well-aligned c-plane growth and distinct van der Waals gaps, as confirmed by X-ray diffraction and transmission electron microscopy. The fabricated PCM device demonstrates notable improvements, including 15 ns switching and reduced operating voltage, owing to efficient thermal management by the TT layer. This study highlights the potential of SLL structures to advance PCM technology and provides a pathway for scalable, high-speed, low-power SCM solutions.
Source: openalex_inverted_index · Quality: baseline

Research context

OpenAlex topics: Phase-change materials and chalcogenides · Chemical and Physical Properties of Materials · Transition Metal Oxide Nanomaterials

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

Affiliations

Department of Materials Science and Engineering, Korea University, Anam-ro 145, Seongbuk-gu, Seoul 136-701, Republic of Korea

ZERC, 620, New Engineering Building, 73-15, Anam-ro, Seongbuk-gu, Seoul 02841, Republic of Korea

Funding

Ministry of Science and ICT, South Korea

References (36)

Show source-provided references
1. 10.1038/nmat200910.1038/nmat2009 ↗
2. 10.1038/s41578-019-0159-310.1038/s41578-019-0159-3 ↗
3. 10.1002/advs.20210347810.1002/advs.202103478 ↗
4. 10.1038/s41578-018-0076-x10.1038/s41578-018-0076-x ↗
5. 10.1002/adfm.20180338010.1002/adfm.201803380 ↗
6. 10.1038/s41928-018-0092-210.1038/s41928-018-0092-2 ↗
7. 10.1038/s41586-020-03070-110.1038/s41586-020-03070-1 ↗
8. 10.1002/adma.20170558710.1002/adma.201705587 ↗
9. 10.1126/science.116023110.1126/science.1160231 ↗
10. 10.1116/1.330157910.1116/1.3301579 ↗
11. 10.1147/JRD.2008.538855810.1147/JRD.2008.5388558 ↗
12. 10.1063/1.34862010.1063/1.348620 ↗
13. 10.1109/TED.2017.274634210.1109/TED.2017.2746342 ↗
14. 10.1103/PhysRevLett.21.145010.1103/PhysRevLett.21.1450 ↗
15. 10.1109/JPROC.2010.207005010.1109/JPROC.2010.2070050 ↗
16. 10.1109/JETCAS.2016.254771810.1109/JETCAS.2016.2547718 ↗
17. Lai, S. Technical Digest - International Electron Devices Meeting , 2003; p 255.
18. Pirovano, A.; Lacaita, A. L.; Benvenuti, A.; Pellizzer, F.; Hudgens, S.; Bez, R. Technical Digest - International Electron Devices Meeting , 2003; p 699.
19. Bez, R. Technical Digest - International Electron Devices Meeting(IEDM) , 2009; p 1.
20. 10.1021/nl902777z10.1021/nl902777z ↗
21. 10.1002/adfm.20200341910.1002/adfm.202003419 ↗
22. 10.1063/1.486343010.1063/1.4863430 ↗
23. 10.1016/j.apsusc.2010.12.01710.1016/j.apsusc.2010.12.017 ↗
24. 10.1016/j.apsusc.2008.03.00610.1016/j.apsusc.2008.03.006 ↗
25. 10.1021/acsami.5b0008310.1021/acsami.5b00083 ↗
26. 10.1016/j.actamat.2023.11880910.1016/j.actamat.2023.118809 ↗
27. 10.1063/1.482781510.1063/1.4827815 ↗
28. 10.1016/j.apsusc.2011.07.07210.1016/j.apsusc.2011.07.072 ↗
29. 10.1021/acsami.0c0302710.1021/acsami.0c03027 ↗
30. 10.1002/adma.20220714310.1002/adma.202207143 ↗
31. 10.1016/j.apsusc.2022.15427410.1016/j.apsusc.2022.154274 ↗
32. 10.1016/j.jallcom.2023.16907310.1016/j.jallcom.2023.169073 ↗
33. 10.1002/aelm.20240079010.1002/aelm.202400790 ↗
34. 10.1002/adfm.20240889710.1002/adfm.202408897 ↗
35. 10.1002/smll.20170451410.1002/smll.201704514 ↗
36. 10.1109/LED.2019.292583210.1109/LED.2019.2925832 ↗