Source abstract
Abstract
In this work, we report the graphene-promoted formation of an interfacial oxide layer when certain metals are deposited on graphene. We probe interfacial oxide formation through the observation that several metals, when 10–12 nm in thickness and deposited on graphene on a transparent substrate, show a change in optical contrast compared to that in areas where the metal directly contacts the substrate. Aluminum shows this effect, while platinum and nickel do not exhibit such a pronounced optical contrast change. To understand this phenomenon, we characterize the Al-graphene, Ti-graphene, and Ni-graphene interfaces using techniques including X-ray photoelectron spectroscopy depth profiling, X-ray reflectivity, and Raman spectroscopy. These techniques show the presence of oxide at the buried metal–graphene interface for the cases of aluminum and titanium deposition, and we discuss how this explains the change in optical contrast. We show that this process is sensitive to the background vacuum level during deposition. In the case of nickel, we did not observe the presence of an oxide. Building upon these findings, we propose structures for Al-graphene, Ti-graphene, and Ni-graphene interfaces. We propose a model based on the metal work function and interaction with graphene that can guide the metals for which interfacial oxidation is to be expected, and we discuss the role of the deposition conditions in controlling the extent of oxide formation. These observations provide important implications for various devices using graphene as either the channel or the contact. Depending on whether a metal–graphene interfacial oxide is desirable and its functionality, these findings will afford guidance for their fabrications in the future.
Source: openalex_inverted_index · Quality: baseline
Affiliations
Department of Electrical Engineering and Computer Science
Massachusetts Institute of Technology
Department of Materials Science and Engineering
Department of Electrical and Computer Engineering, Duke University, 130 Hudson Hall, Durham, North Carolina 27708, United States
Semiconductor Research Cooperation, 4819 Emperor Blvd, Suite 300Durham, North Carolina 27703, United States
Intel Laboratories, Intel Corporation, 2111 NE 25th Ave, Hillsboro, Oregon 97124, United States
Department of Materials Science and NanoEngineering
Rice University
Applied Physics Graduate Program, Smalley-Curl Institute
Lincoln Laboratory
Funding
Welch Foundation · Army Research Office · Air Force Office of Scientific Research · Semiconductor Research Corporation · American Chemical Society Petroleum Research Fund · Division of Civil, Mechanical and Manufacturing Innovation · National Science Foundation