journal article·2024-08-09Open access

Tailoring Interlayer Coupling in Few-Layer MoS2 with Stacking Configuration

Jong Hun Kim, Kyung-Hwan Jin, Yeonjoon Jung, Gwan-Hyoung Lee, Jaeyoon Baik, Daehyun Kim, Moon-Ho Jo, Arthur P. Baddorf, An-Ping Li, Jewook Park

ACS Applied Nano Materials· Volume 7· Issue 15

Abstract

We manipulated the stacking configuration of a few-layer MoS 2 to investigate the impact of interlayer coupling on electrical band engineering. By simultaneously synthesizing two distinct stacking types of MoS 2 islands, wedding cake (W) and spiral (S), on the same substrate, we explored layer-dependent electrical properties under identical experimental conditions. We used multiple scanning probe microscopy techniques to map local electronic properties with respect to the number of layers, stacking configurations, and local heterogeneities. First-principles calculations verified the role of distinct interlayer coupling in terms of the interlayer distance. Our findings highlight the critical role of interlayer coupling in applications of transition metal dichalcogenides.
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Research context

OpenAlex topics: 2D Materials and Applications · Graphene research and applications · Transition Metal Oxide Nanomaterials

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Affiliations

Department of Physics, Inha University, Incheon 22212, Republic of Korea

Department of Materials Science and Engineering, Seoul National University, Seoul 08826, Republic of Korea

Research Institute of Advanced Materials, Seoul National University, Seoul 08826, Republic of Korea

Department of Physics and Research Institute of Physics and Chemistry, Jeonbuk National University, Jeonju 54896, Republic of Korea

Center for Artificial Low Dimensional Electronic Systems, Institute for Basic Science (IBS), Pohang 37673, Republic of Korea

Institute of Engineering Research, Seoul National University, Seoul 08826, Republic of Korea

Institute of Applied Physics, Seoul National University, Seoul 08826, Republic of Korea

Pohang Accelerator Laboratory, 80 Jigok-ro 127 beon-gil, Nam-gu, Pohang-si, Gyeongsangbuk-do 37673, Republic of Korea

Korean Testing & Research Institute, 15 Jongga-ro, Jung-gu, Ulsan 44412, Republic of Korea

Department of Materials Science and Engineering, Pohang University of Science and Technology (POSTECH), Pohang 37673, Republic of Korea

Center for van der Waals Quantum Solid, Institute for Basic Science (IBS), Pohang 37673, Republic of Korea

Center for Nanophase Materials Sciences, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831, United States

Funding

Inha University · Ministry of Trade, Industry and Energy · Institute for Basic Science · Jeonbuk National University

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