journal article·2014-04-03

Misfit dislocation formation in stressed nanofilms

Jérôme Colin

Philosophical Magazine Letters· Volume 94· Issue 4
Publisher page

Abstract

The nucleation of a dipole of edge dislocations is theoretically investigated in a layer embedded in a nanofilm when the nanostructure is submitted to misfit stress. The effect of stress and nanofilm dimensions has been characterized on the introduction of the dipole of misfit dislocations, from the free surfaces to the centre of the layer. A stability diagram for the nanostructure is finally provided with respect to this particular defect nucleation.
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Research context

OpenAlex topics: Metal and Thin Film Mechanics · Microstructure and mechanical properties · Copper Interconnects and Reliability

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