journal article·2018-04

Effect of hexagonal hillock on luminescence characteristic of multiple quantum wells structure

Jinjuan Du, Shengrui Xu, Peixian Li, Jincheng Zhang, Ying Zhao, Ruoshi Peng, Xiaomeng Fan, Yue Hao

Optical Materials· Volume 78
Publisher page

Abstract

Abstract GaN based ultraviolet multiple quantum well structures grown on a c-plane sapphire substrate by metal organic chemical deposition showed a microstructure with a large amount of huge hexagonal hillocks. The polarity of the sample is confirmed by etching with sodium hydroxide solution. The luminous intensity distribution of a typical hexagonal hillock was investigated by the phototluminescent mapping and the luminous intensity at hillock top regions was found to be 15 times higher than that of the regions around hillocks. The reduction of dislocations, the decreasing of the quantum confirmed stack effect caused by semipolar plane and the inclination of the sidewalls of the hexagonal hillock were responsible for the enhancement of luminous intensity.
Source: openaire · Quality: candidate unverified · Source record ↗

Research context

OpenAlex topics: GaN-based semiconductor devices and materials · Semiconductor Quantum Structures and Devices · ZnO doping and properties

SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.

References (22)

Show source-provided references
1. High electron mobility transistor based on a GaN/AlxGa1-xN heterojunction10.1063/1.109775 ↗
2. InGaN/GaN MQW high brightness LED grown by MOCVD10.1016/S0925-3467(03)00081-8 ↗
3. Dependence of adhesion strength between GaN LEDs and sapphire substrate on power density of UV laser irradiation10.1016/j.apsusc.2016.05.078 ↗
4. Dry etching characteristics of GaN for blue/green light-emitting diode fabrication10.1016/j.apsusc.2009.01.041 ↗
5. High-sheet-charge–Carrier-density AlInN/GaN field-effect transistors on Si (111)10.1063/1.1828580 ↗
6. The polarity of GaN: a critical review10.1557/S1092578300000831 ↗
7. Review of polarity determination and control of GaN10.1557/S1092578300000363 ↗
8. Wetting behaviour of GaN surfaces with Ga- or N-Face polarity10.1002/1521-3951(200111)228:2<519::AID-PSSB519>3.0.CO;2-A ↗
9. Influence of the substrate misorientation on the properties of N-polar GaN films grown by metal organic chemical vapor deposition10.1063/1.2801406 ↗
10. Two-dimensional electron gases in Ga-face and N-face AlGaN/GaN heterostructures grown by plasma-induced molecular beam epitaxy and metalorganic chemical vapor deposition on sapphire10.1063/1.372353 ↗
11. Structure and composition of GaN (0001) A and B surfaces10.1063/1.370574 ↗
12. Dislocation mediated surface morphology of GaN10.1063/1.370150 ↗
13. Raman mapping of hexagonal hillocks in N-polar GaN grown on c-plane sapphire10.1016/j.spmi.2017.02.012 ↗
14. MOCVD growth of N-polar GaN on on-axis sapphire substrate: impact of AlN nucleation layer on GaN surface hillock density10.1016/j.jcrysgro.2016.02.029 ↗
15. Adatom diffusion at GaN (0001) and (0001-) surfaces10.1063/1.121909 ↗
16. Submicron periodic poling and chemical patterning of GaN10.1063/1.2009839 ↗
17. Investigation of defects and polarity in GaN using hot wet etching, atomic force and transmission electron microscopy and convergent beam electron diffraction10.1002/1521-3951(200111)228:2<513::AID-PSSB513>3.0.CO;2-Y ↗
18. A method used to overcome polarization effects in semi-polar structures of nitride light-emitting diodes emitting green radiation10.1007/s00339-013-7596-4 ↗
19. Indium incorporation in semipolar (202-1) and nonpolar (101-0) InGaN grown by plasma assisted molecular beam epitaxy10.1016/j.jcrysgro.2016.11.105 ↗
20. GaN and InGaN (112-2) surfaces: group-III adlayers and indium incorporation10.1063/1.3240401 ↗
21. Spatial distribution of crystalline quality in N-type GaN grown on patterned sapphire substrate10.1364/OME.6.001817 ↗
22. On the origin of threading dislocations in GaN films10.1063/1.3225920 ↗