Formation of channel waveguide with grating in polymer films based on simultaneous photobleaching and embossing

Channel waveguide with grating is fabricated in nonlinear optical (NLO) polymer thin films by means of simultaneous embossing and photobleaching. A combined structure of mask/master consisting of a photomask part and a grating die part which is made of polyimide is fabricated. Then the mask/master is set on the NLO polymer films and both embossing and photobleaching are performed simultaneously. Profiles of the replica grating and the channel waveguide are estimated.