Fast optical limiting on volatilizable metallic mirror
Source abstract
Abstract
Abstract We report on the investigation into an optical limiter, utilizing ablation destruction of a thin-film metallic mirror affected by high-intensity laser irradiation with nanosecond pulse duration. Its limiting threshold and dynamic range showed up being dependent on both the type of a material used and the thickness of the metallic film, as well as the type of the substrate material. An aluminum film deposited onto a polycarbonate substrate with reflection coefficient of weak irradiation being 90% has a limiting threshold 30 mJ/cm2, whilst reflection coefficient drops down to 1% at pulse energy density 200 J/cm2, wavelength being 1.06 μm.
Source: openaire · Quality: candidate unverified · Source record ↗
Research context
OpenAlex topics: Nonlinear Optical Materials Studies · Laser Material Processing Techniques · Laser-Ablation Synthesis of Nanoparticles
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
References (18)
Show source-provided references
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