journal article·2006-05

Comparative optical study of Eu3+ ions doping in InGaN/GaN quantum dots and GaN layer grown by molecular beam epitaxy

Thomas Andreev, Nguyen Quang Liem, Yuji Hori, Mitsuhiro Tanaka, Osamu Oda, Bruno Daudin, Daniel Le Si Dang

Optical Materials· Volume 28· Issue 6-7
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Abstract

Abstract We report on a comparative optical study of InGaN:Eu quantum dots (QDs) and GaN:Eu layer grown by molecular beam epitaxy (MBE). Analysis of the 5D0 → 7F2 transition as a function of the excitation wavelength shows that Eu3+ ions in InGaN:Eu QDs are located inside InGaN QDs and also in the GaN barrier layer. The existence of Eu3+ ions in the GaN barrier layer is explained by Eu segregation/diffusion during growth. For Eu3+ ions located inside InGaN QDs the photoluminescence (PL) shows only a slight decrease with temperature from 5 K to 300 K. In contrast, the PL from Eu3+ ions in the GaN barrier layer or in GaN thick layer shows a much more pronounced thermal quenching.
Source: openaire · Quality: candidate unverified · Source record ↗

Research context

OpenAlex topics: GaN-based semiconductor devices and materials · Ga2O3 and related materials · Semiconductor Quantum Structures and Devices

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