Optical near-field lithography in chalcogenide films

Abstract Chalcogenide glasses have attracted much interest for use in many fields of optics: microoptics, diffractive optics, optical communication, non-linear optics, etc. This paper focuses on the fabrication of subwavelength gratings based on nano-photolithography using chalcogenide films and scanning atomic force microscope (AFM) equipped with an optical near field source. The nano-lithography system is described and the results obtained using As 2 S 3 chalcogenide films are presented. Variable period gratings with 100 nm line width are presented.