Effect of thickness on optical properties of nickel vertical posts deposited by GLAD technique
Source abstract
Abstract
Abstract Nickel (Ni) thin films of different thicknesses (25 nm to 150 nm) were deposited on glass substrates using Glancing Angle Deposition technique. Characterization of obtained Ni films was performed by scanning electron microscopy, atomic force microscopy, X-ray photoelectron spectroscopy, spectroscopic ellipsometry and by four-point probe method. Variations in optical parameters with thickness correlated with structural, chemical and electrical properties of nanostructured nickel thin films were studied. The results showed that deposit is porous and consists of nano-scaled columns, which grow perpendicular to the substrate. It was found that the size of the columns and the surface roughness change with film thickness. Spectroscopic ellipsometry revealed that the refractive index and extinction coefficient varied with thickness, which can be correlated with changes in microstructure of Ni films. Additionally, the relationship between the film microstructure and its resistivity was also analyzed. It was found that the variations in Ni films resistivity could be attributed to the changes in the width of the columns. The increasing of layer thickness leads to overall decrease of optical resistivity of nickel thin films.
Source: openaire · Quality: candidate unverified · Source record ↗
Research context
OpenAlex topics: Optical Coatings and Gratings · Metal and Thin Film Mechanics · Copper Interconnects and Reliability
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
References (48)
Show source-provided references
1. 2014
2. High corrosion-resistance nanocrystalline Ni coating an AZ91D magnesium alloy10.1016/j.surfcoat.2005.07.001 ↗
3. Curie temperature of nickel10.1007/s10973-011-1448-2 ↗
4. The thermal conductivity of nickel10.1016/0017-9310(65)90017-7 ↗
5. Development of a recycling process for nickel-metal hydride batteries10.1016/j.jpowsour.2005.10.046 ↗
6. Optical characterization of industrially sputtered nickel–nickel oxide solar selective surface10.1016/S0038-092X(00)00023-2 ↗
7. Nickel: a review of its sources and environmental toxicology
8. Bendak · 2011
9. Fabrication of patterned media for high density magnetic storage
10. Internal stress in titanium, nickel, molybdenum and tantalum films deposited by cylindrical magnetron sputtering10.1116/1.569113 ↗
11. Effect of deposition parameters on microstructure of electrodeposited nickel thin films10.1007/s10853-009-3475-y ↗
12. Ultrafast spin dynamics in ferromagnetic nickel10.1103/PhysRevLett.76.4250 ↗
13. Nickel thin films prepared by chemical vapour deposition from nickel acetylacetonate10.1007/BF00570088 ↗
14. Toward perfect antireflection coatings: numerical investigation10.1364/AO.41.003075 ↗
15. Toward perfect antireflection coatings. 2. Theory10.1364/AO.43.001286 ↗
16. Experimental demonstration of guiding and confining light in nanometer-size low-refractive-index material10.1364/OL.29.001626 ↗
17. GaInN light-emitting diode with conductive omnidirectional reflector having a low-refractive-index indium-tin oxide layer10.1063/1.2159097 ↗
18. High index contrast mirrors for optical microcavities10.1063/1.103443 ↗
19. Vertically oriented GaN-based air-gap distributed Bragg reflector structure fabricated using band-gap-selective photoelectrochemical etching10.1063/1.2008380 ↗
20. Dye sensitized solar cells incorporating obliquely deposited titanium oxide layers10.1016/j.solmat.2004.05.001 ↗
21. Glancing angle deposited titania films for dye sensitized solar cells10.1016/j.tsf.2009.09.026 ↗
22. In situ ellipsometric study of optical properties of ultrathin films10.1364/AO.31.001612 ↗
23. Optical properties of nickel thin films deposited by electroless plating10.1016/S0040-6090(97)00026-6 ↗
24. Fundamentals and applications of spectroscopic ellipsometry10.1590/S0100-40422002000500015 ↗
25. Wooten · 1972
26. Dispersive optical parameters of Ni(100) crystal and thermally evaporated nickel films10.1142/S0217984911500291 ↗
27. Optical metrology of Ni and NiSi thin films used in the self-aligned silicidation process10.1063/1.3380665 ↗
28. The influence of growth parameters on the optical properties and morphology of UHV deposited Ni thin films10.1016/j.optcom.2008.05.051 ↗
29. X-ray photoelectron spectroscopic chemical state quantification of mixed nickel metal, oxide and hydroxide systems10.1002/sia.3026 ↗
30. Fairley · 2005
31. The study of polycrystaline nickel metal oxidation by water vapour10.1016/j.elspec.2009.07.006 ↗
32. Nb3d and O1s core levels and chemical bonding in niobates10.1016/j.elspec.2004.10.003 ↗
33. Low-energy Ar+ ion-beam-induced amorphization and chemical modification of potassium titanyl arsenate (001) crystal surfaces10.1021/jp0671392 ↗
34. Surface crystallography and electronic structure of potassium yttrium tungstate10.1063/1.2963957 ↗
35. Ti2p and O1s core levels and chemical bonding in titanium-bearing oxides10.1016/j.elspec.2006.02.004 ↗
36. Beamson · 1992
37. Data analysis for spectroscopic ellipsometry10.1016/0040-6090(93)90298-4 ↗
38. Palik · 1985 · vol. I
39. Optical characterization of thermally oxidized Ni films10.1088/0022-3727/42/11/115407 ↗
40. Ramakrishna · 2008
41. HoribaJobin Yvon – Spectroscopic Ellipsometry: User Guide (P/N: 31 087 134).
42. Rancourt · 1987
43. Formation of broad band antireflective coatings on fused silica for high power laser applications10.1016/0040-6090(85)90089-6 ↗
44. Optical properties of metallic films for vertical-cavity optoelectronic devices10.1364/AO.37.005271 ↗
45. Increase in electrical resistivity of copper and aluminum fine lines10.2320/matertrans.43.1621 ↗
46. Chopra · 1979
47. Effect of processing conditions on microstructure and electrical characteristics of Ni thin films10.1016/j.vacuum.2009.10.012 ↗
48. Hawkeye · 2014