Growth and optical characterization of ZnO thin films deposited on sapphire substrate by MOCVD technique

Abstract Thin films of Zinc oxide (ZnO) are deposited on sapphire substrates by a metalorganic chemical vapour deposition (MOCVD) process. ZnO thin films were characterized by X-ray diffraction, Raman spectroscopy. Investigation of film’s guiding and optical properties is performed using m-lines spectroscopy. Ordinary and extraordinary refractive indices and the optical anisotropy are determined from TE and TM mode excitations. An analysis of optical anisotropy using guided modes with the optical axis oriented normal to the film’s surface confirm the layer’s uniaxial nature. Finally, the optical propagation loss was determined around 4.17 dB/cm at 632.8 nm.