Influence of thermal annealing on optical properties and structure of aluminium oxide thin films by filtered cathodic vacuum arc
Source abstract
Abstract
Abstract Optical and structural properties of aluminium oxide thin films are investigated in the annealing temperature range of 200–900 °C. The changes in optical properties and film structure show the great dependence on the temperature. For the film annealed at low temperatures (from 200 °C to 600 °C), the film optical properties, such as transmittance and optical constants, could be improved by thermal annealing with amorphous structure and smooth surface. However, for the film annealed at higher temperature (e.g. 900 °C), the poor performance of optical properties indicates undesirable application for precise use in optics due to significant changes in both structure and surface roughness. At optimum annealing temperature of 600 °C, the transmittance could reach as high as that of substrate and the film possesses better optical constants (refractive index was 1.73 and extinction coefficient was ∼10−4 at 550 nm) with remaining amorphous structure and smooth surface.
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Research context
OpenAlex topics: Semiconductor materials and devices · ZnO doping and properties · Metal and Thin Film Mechanics
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References (15)
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