Relation of the photorefraction and optical-damage resistance to the intrinsic defect structure in LiNbO3 crystals

Abstract The defect structure of LiNbO3 crystals doped with optical-damage-resistant impurities Zn and In was studied by X-ray and neutron diffraction methods. Photoinduced charge transport in these crystals is discussed in the context of the deduced defect models. In LiNbO3:Zn and LiNbO3:In an increase of the photoconductivity σph and the resulting lowering of photorefraction is related to a variation of the intrinsic defect (NbLi and VLi) concentration. In crystals co-doped with iron an increase of σph is due to a change of the lattice site of the Fe3+-electron trap.