Refining multi-photon polymerization feature size by optimizing solvent content in SU-8 photoresist
Source abstract
Abstract
Abstract An investigation of the impact of solvent content on polymerization feature size in multi-photon polymerization is presented. The negative tone, epoxy photoresist SU-8 is employed, and variety pre-baking time is set to obtain different solvent content. A convenient method, exposure under long-focal length and single pulse, is suggested to evaluate the impact of solvent. By measuring the polymer size under microscope, it shows that the polymerized diameters are reduced by ~40% due to only 4% loss of the solvent content. The inhibition of the mobility of photon-induced H+ cations due to the less solvent is considered to be responsible for the refinement of polymer feature size. It is because that the mobility of photon-induced H+ cation from high to low concentration area is restricted by reducing the solvent. The adjusting solvent content shows its potential to refine the feature size of MPP without influencing the degree of polymerization.
Source: openaire · Quality: candidate unverified · Source record ↗
Research context
OpenAlex topics: Nonlinear Optical Materials Studies · Advancements in Photolithography Techniques · Photopolymerization techniques and applications
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
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