Optical properties of plasma-assisted molecular beam epitaxy grown InN/sapphire
Source abstract
Abstract
Abstract The optical properties of as-grown InN/sapphire films prepared by plasma assisted molecular beam epitaxy (PA-MBE) are characterized by photoluminescence (PL), Raman scattering (RS) and infrared (IR) reflectance techniques. The PL measurements have consistently exhibited lower values of InN band gaps providing clear indications of electron concentration dependent peak energy shifts and widths. The phonon modes identified by RS are found to be in good agreement with the grazing inelastic X-ray scattering measurements and ab initio lattice dynamical calculations. An effective medium theory used to analyze IR reflectance spectra of InN/sapphire films has provided reasonable estimates of free charge carrier concentrations.
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Research context
OpenAlex topics: GaN-based semiconductor devices and materials · ZnO doping and properties · Ga2O3 and related materials
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