Fabrication and characterization of plasmonic nanorods with high aspect ratios

Abstract Metallic nanostructures with high aspect ratios are important for developing devices in photonics and integrated optics. However, fabricating well-aligned plasmonic arrays is challenging due to the difficulties of etching metals. In this work, we investigate the feasibility of constructing high aspect ratio nanorods with desired shapes and controllable geometric parameters using direct focused ion beam etching. The whole fabrication process only involves a metal-deposition step and a single milling of designed patterns. Detailed characterizations of the fabricated devices are also experimentally demonstrated.