The threshold effect of incident exposure energy flux for photorefractive light-induced scattering in doped lithium niobate crystals
Source abstract
Abstract
Abstract The threshold effect of incident exposure energy flux is proposed to measure the light-induced scattering in doped LiNbO3 crystals. The dependences of the exposure energy flux threshold on the concentration of damage-resistant dopants as well as oxidation–reduction treatment are investigated experimentally in doped LiNbO3 crystals. The results show that doping with damage-resistant dopants and oxidation–reduction treatment are simple and effective methods to control and optimize the photorefractive properties of doped LiNbO3 crystals. The high signal-to-noise ratio reconstructions are also demonstrated experimentally according to the incident exposure energy flux threshold in triply-doped LiNbO3 crystals. Comparing with the known incident intensity threshold method, the exposure energy flux threshold method is more effective for estimating the light-induced scattering of photorefractive recording materials.
Source: openaire · Quality: candidate unverified · Source record ↗
Research context
OpenAlex topics: Photorefractive and Nonlinear Optics · Photonic and Optical Devices · Advanced Fiber Laser Technologies
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
References (24)
Show source-provided references
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