Glassy mAs2S3·nAs2Se3 photoresist films for interference laser lithography
Source abstract
Abstract
Abstract Spectra of refractive index and selective dissolution of several glassy m As 2 S 3 · n As 2 Se 3 films are studied. These results permitted to select efficient photoresist compositions for interference laser lithography, performed with Ar + -, He–Ne- and Nd:YAG-laser beams, and to fabricate the two- and three-dimensional photonic crystals.
Source: openaire · Quality: candidate unverified · Source record ↗
Research context
OpenAlex topics: Phase-change materials and chalcogenides · Photonic Crystals and Applications · Nonlinear Optical Materials Studies
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References (15)
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1. Nagai · Appl. Phys. Lett. · 1976 · 28 · 14510.1063/1.88669 ↗
2. Chang · J. Vac. Sci. Technol. · 1979 · 16 · 197310.1116/1.570369 ↗
3. Lyubin · Microelectronica · 1989 · 18 · 523
4. Vlcek · J. Non-Cryst. Solids · 1998 · 227–230 · 74310.1016/S0022-3093(98)00237-3 ↗
5. Stronski · J. Non-Cryst. Solids · 2000 · 266–269 · 97310.1016/S0022-3093(00)00032-6 ↗
6. Lyubin · J. Vac. Sci. Technol. B · 1997 · 15 · 82310.1116/1.589492 ↗
7. Eisenberg · J. Optoel. Adv. Mater. · 2002 · 4 · 405
8. Saitoh · Opt. Lett. · 2000 · 25 · 175910.1364/OL.25.001759 ↗
9. A. Feigel, M. Veinger, B. Sfez, A. Arsh, M. Klebanov, V. Lyubin, Thin Solid Films, in press
10. Feigel · Appl. Phys. Lett. · 2000 · 77 · 322110.1063/1.1326042 ↗
11. Feigel · Appl. Phys. Lett. · 2003 · 83 · 448010.1063/1.1631387 ↗
12. Chang · Thin Solid films · 1978 · 55 · 46310.1016/0040-6090(78)90163-3 ↗
13. Swanepoel · J. Phys. E · 1983 · 16 · 121410.1088/0022-3735/16/12/023 ↗
14. Stronski · Proc. SPIE · 1997 · 3359 · 37910.1117/12.306248 ↗
15. Vlček · J. Non-Cryst. Solids · 2000 · 266–269 · 96410.1016/S0022-3093(00)00038-7 ↗