Optical behaviour of magnetron sputtered nano-hilled TiN coatings
Bibliographic record
Abstract
No abstract is available for this record. The assistant can identify its topic from the title, but cannot infer the study’s results.
Source: Not provided · Quality: missing
Research context
OpenAlex topics: Metal and Thin Film Mechanics · GaN-based semiconductor devices and materials · Semiconductor materials and devices
SciVX discovery tags are terminology-based. OpenAlex topics are source-provided classifications.
References (57)
Show source-provided references
1. Recent progress in nanostructured transition metal nitrides for advanced electrochemical energy storage10.1039/C8TA05760E ↗
2. Recent developments and applications of TiN-based films synthesized by magnetron sputtering10.1007/s11665-023-08273-x ↗
3. The plasma nitriding treatment of TiN/TiCN multilayer films10.1016/j.apsusc.2012.12.058 ↗
4. Nanostructured thin films–background, preparation and relation to the technological revolution of the 21st century10.1016/B978-0-08-102572-7.00001-5 ↗
5. Evaluation of different dispersion models for correlation of spectroscopic ellipsometry and X-ray reflectometry10.1063/1.5050492 ↗
6. Using interference enhancement to increase the information content of spectroscopic ellipsometry measurements
7. Optical, electrical and mechanical properties of TiN thin film obtained from a TiO2 sol-gel coating and rapid thermal nitridation10.1016/j.surfcoat.2021.127089 ↗
8. Choudhury · 2018 · vol. 7 · 959
9. Functionally gradient SiC coatings produced by chemical vapor reaction10.1557/PROC-363-251 ↗
10. Extremely hard, damage-tolerant ceramic coatings with functionally graded, periodically varying architecture10.1016/j.actamat.2012.09.049 ↗
11. Preparation and hydrogen penetration performance of TiO2/TiCx composite coatings10.1016/j.ijhydene.2020.03.049 ↗
12. Evaluating residual stresses in compositionally graded TiN films via ab initio and Rietveld simulation
13. Effects of annealing on TiN thin film growth by DC magnetron sputtering
14. Structural, optical and electrical properties of argon implanted TiN thin films10.1016/j.ijrmhm.2014.09.026 ↗
15. Influence of sputtering power on properties of titanium thin films deposited by rf magnetron sputtering
16. Optical properties and microstructure of TiN thin films before and after annealing10.1166/mex.2019.1471 ↗
17. Impact of nitrogen reactive gas and substrate temperature on the optical, electrical and structural properties of sputtered TiN thin films10.1007/s10854-020-04523-z ↗
18. Optical properties of plasmonic ultrathin TiN films10.1002/adom.201700065 ↗
19. Synthesis of magnetron-sputtered TiN thin-films on fiber structures for pulsed-laser emission and refractive-index sensing applications at 1550 nm10.3390/coatings13010095 ↗
20. Structure and optical properties of TiN films prepared by dc sputtering and by ion beam assisted deposition10.1016/0042-207X(92)90056-3 ↗
21. Influence of substrate and Ar/N2 gas flow ratio on structural, optical and electrical properties of TiN thin films synthetized by DC magnetron sputtering10.1007/s10854-018-9031-2 ↗
22. Structural properties of TiN thin films prepared by RF reactive magnetron sputtering
23. Comparative study of corrosion and corrosion-wear behavior of TiN and CrN coatings on UNS S17400 stainless steel10.1515/corrrev-2017-0130 ↗
24. Pressure and temperature effects on stoichiometry and microstructure of nitrogen-rich TiN thin films synthesized via reactive magnetron DC-sputtering10.1155/2008/267161 ↗
25. Microstructure, residual stress, and fracture of sputtered TiN films10.1016/j.surfcoat.2013.03.009 ↗
26. The effect of magnetic field configuration on structural and mechanical properties of TiN coatings deposited by HiPIMS and dcMS10.1016/j.surfcoat.2020.126572 ↗
27. Morphology of TiN thin films grown on SiO2 by reactive high power impulse magnetron sputtering
28. Influence of nitrogen gas flow rate on the structural, morphological and electrical properties of sputtered TiN films10.1007/s10854-012-0905-4 ↗
29. Uncertainty of the X-ray diffraction (XRD) sin 2 Ψtechnique in measuring residual stresses of physical vapor deposition (pvd) hard coatings10.3390/coatings7080128 ↗
30. Thickness dependent microstructural and electrical properties of TiN thin films prepared by DC reactive magnetron sputtering10.1016/j.ceramint.2015.10.070 ↗
31. Deniz · 2008
32. Use of ion beam assisted deposition to modify the microstructure and properties of thin films10.1179/095066090790323975 ↗
33. Gas flow sputtering: versatile process for the growth of nanopillars, nanoparticles, and epitaxial thin films10.1016/j.jmmm.2008.11.053 ↗
34. Effect of Ar: N2 ratio on structure and properties of Ni-TiN nanocomposite thin films processed by reactive RF/DC magnetron sputtering10.1016/j.surfcoat.2013.04.014 ↗
35. Film thickness effect on texture and residual stress sign transition in sputtered TiN thin films10.1016/j.ceramint.2017.06.050 ↗
36. Impact of nitrogen reactive gas and substrate temperature on the optical, electrical and structural properties of sputtered TiN thin films10.1007/s10854-020-04523-z ↗
37. Aissani · Thin Solid Films · 2021 · 72410.1016/j.tsf.2021.138598 ↗
38. Effect of deposition conditions and post deposition anneal on reactively sputtered titanium nitride thin films10.1016/j.tsf.2015.02.009 ↗
39. Structural, spectroscopic and electrical properties of dc magnetron sputtered NiO thin films and an insight into different defect states10.1007/s00339-021-04501-0 ↗
40. XPS and AFM investigations of Ti-Al-N coatings fabricated using DC magnetron sputtering at various nitrogen flow rates and deposition temperatures10.3390/met7020052 ↗
41. Venting temperature determines surface chemistry of magnetron sputtered TiN films10.1063/1.4940974 ↗
42. Transparent TiO2 and ZnO thin films on glass for UV protection of PV modules10.3389/fmats.2019.00259 ↗
43. Highly plasmonic titanium nitride by room-temperature sputtering10.1038/s41598-019-51236-3 ↗
44. Self-powered broadband photodetector using plasmonic titanium nitride10.1021/acsami.6b00249 ↗
45. Co-evaporated SnS thin films for visible light photodetector applications10.1039/C6RA20129F ↗
46. Influence of the substrates nature on optical and structural characteristics of SnO2 thin film prepared by sol-gel technique
47. Spectroscopic ellipsometry studies on the optical constants of indium tin oxide films deposited under various sputtering conditions10.1016/j.tsf.2004.02.047 ↗
48. Large-area flexible thin film encapsulation with high barrier and super-hydrophobic property10.1002/admi.202300172 ↗
49. Optical properties and microstructure of TiNxOy and TiN thin films before and after annealing at different conditions
50. Titanium nitride as a plasmonic material from near-ultraviolet to very-long-wavelength infrared range10.3390/ma14227095 ↗
51. Optical properties of plasmonic titanium nitride thin films from ultraviolet to mid-infrared wavelengths deposited by pulsed-DC sputtering, thermal and plasma-enhanced atomic layer deposition10.1016/j.optmat.2023.114237 ↗
52. Optical properties and plasmon resonances of titanium nitride nanostructures10.1088/0957-4484/21/11/115201 ↗
53. Howlader · 2020
54. Influence of the deposition temperature on the optical and electrical properties of TiN film by spectroscopic ellipsometry10.1016/j.spmi.2021.106815 ↗
55. Woollam Co
56. Spectroscopic ellipsometry: advancements, applications and future prospects in optical characterization10.3390/spectroscj1030014 ↗
57. On the origin of fine structure in the photoluminescence spectra of the β-sialon Eu 2+ green phosphor10.1088/1468-6996/13/1/015004 ↗